3121 S Platte River Drive - Englewood, Colorado 80110
Tel 1.303.783.3172 - Fax 1.303.374.7342
 
 
 
 

Increase Yields and Reduce Costs

As critical dimensions shrink, reticle patterns are more susceptible to contaminants. Random defects can be generated during shipping, handling, or storage as a consequence of particle deposition or damage of chrome lines due to ESD events. In order to meet the requirements of next-generation lithography Pozzetta photomask compacts are designed to reduce particles, prevent ESD, and reduce outgassing. By preventing random defects Pozzetta will increase your yields and reduce your costs.

 

       
 
 
3121 S Platte River Drive - Englewood, Colorado   80110
Contact: sales@pozzetta.com

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